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| University of Cambridge > Department of Engineering > Teaching Office index page > Year group page > Syllabus index page |
ENGINEERING TRIPOS PART IIB – 2012/2013
| Leader: | Dr D.M. Holburn (dmh@eng) |
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Timing: |
Lent Term |
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Prerequisites: |
3B1, 3B2, 3B5 assumed; 3B3, 3B6 useful |
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Structure: |
12 lectures (including examples classes) + coursework |
| Assessment: | Material / Format / Timing / Marks Lecture Syllabus / Written exam (1.5 hours) / Start of Easter Term / 75 % Coursework / Report / End of Lent Term / 25 % |
AIMS
The aim of this module is to describe the design, technology and manufacture of MOS integrated circuits and future nanoscale electron devices. It will provide a firm foundation for those wishing to pursue careers in applications or in research/development in the field of semiconductor devices/circuits.
LECTURE SYLLABUS
VLSI Design and CAD of MOS Integrated Circuits (6L, Dr D.M. Holburn)
Integrated Devices and VLSI Technology (6L, Prof.M.Kelly)
COURSEWORK
Either (a) 2 hour laboratory practical to assess the performance of CMOS devices and
ring oscillators, with a 4 side report;
or (b) 2 hour hands-on scanning electron microscope examination of devices and
circuits, with 4-side report;
OBJECTIVES
On completion of the module students should:
REFERENCES
Please see the Booklist for Group B Courses for references for this module.
Last updated: June 2012